Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents.
| Main Author: | |
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| Format: | eBook |
| Language: | English |
| Published: |
Linköping :
Linkopings Universitet,
2021.
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| Edition: | 1st ed. |
| Series: | Linköping Studies in Science and Technology. Dissertations Series
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| Subjects: | |
| Online Access: | Click to View |
Table of Contents:
- Intro
- Abstract
- Populärvetenskaplig Sammanfattning
- ملخص علم ي
- Preface
- Acknowledgement
- List of Articles
- Table of Contents
- 1. Introduction
- 2. Chemical Vapor Deposition
- 3. Area Selective CVD
- 4. Characterization Techniques
- 5.Contribution to the Field
- 6. Outlook
- References
- Papers.