Nadhom, H. (2021). Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents. Linköping: Linkopings Universitet.
Chicago Style CitationNadhom, Hama. Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents. Linköping: Linkopings Universitet, 2021.
MLA CitationNadhom, Hama. Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents. Linköping: Linkopings Universitet, 2021.
Warning: These citations may not always be 100% accurate.