Zhang, H. (2022). Hot-Wall MOCVD of N-polar Group-III Nitride Materials and High Electron Mobility Transistor Structures. Linköping: Linkopings Universitet.
Chicago Style CitationZhang, Hengfang. Hot-Wall MOCVD of N-polar Group-III Nitride Materials and High Electron Mobility Transistor Structures. Linköping: Linkopings Universitet, 2022.
MLA CitationZhang, Hengfang. Hot-Wall MOCVD of N-polar Group-III Nitride Materials and High Electron Mobility Transistor Structures. Linköping: Linkopings Universitet, 2022.
Warning: These citations may not always be 100% accurate.